• CVD System NBD-O1200-XT22D2F
  • CVD System NBD-O1200-XT22D2F
  • CVD System NBD-O1200-XT22D2F
  • CVD System NBD-O1200-XT22D2F
  • CVD System NBD-O1200-XT22D2F

CVD system

Model : NBD-O1200-XT22D2F

Chemical vapor deposition (CVD) is a method of synthesizing coatings or nanomaterials by reacting chemical gases or vapors on a substrate surface. It is a widely used technique in the semiconductor industry for depositing thin film materials, including a wide range of insulating materials, as well as most metals and metal alloys.

Therefore, we have developed a complete CVD coating system suitable for materials laboratories in universities, research institutes, and environmental science fields.

Product Model

NBD-O1200-XT22

(Furnace tube diameter optional: 50, 60, 80, 100mm)

Operating Temperature

≤ 1150℃

Heating Zone Size

200mm + 200mm

(Dual temperature, dual control)

Heating Rate

≤ 20℃ / min

Electrical Specifications

AC 220V  4KW

◎ CE Certified

◎ Brand / NOBODY


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