CVD system
Chemical vapor deposition (CVD) is a method of synthesizing coatings or nanomaterials by reacting chemical gases or vapors on a substrate surface. It is a widely used technique in the semiconductor industry for depositing thin film materials, including a wide range of insulating materials, as well as most metals and metal alloys.
Therefore, we have developed a complete CVD coating system suitable for materials laboratories in universities, research institutes, and environmental science fields.
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Product Model |
NBD-O1200-XT22 (Furnace tube diameter optional: 50, 60, 80, 100mm) |
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Operating Temperature |
≤ 1150℃ |
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Heating Zone Size |
200mm + 200mm (Dual temperature, dual control) |
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Heating Rate |
≤ 20℃ / min |
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Electrical Specifications |
AC 220V 4KW |
◎ CE Certified
◎ Brand / NOBODY