• Plasma sputtering machine

Plasma sputtering machine


Designed specifically for SEM sample preparation, this instrument features a simple structure and ease of use. It does not require a high vacuum level for ion sputtering, making it a basic tool for SEM sample coating.


Key Features

1. Utilizes a 2C silent vacuum pump for comprehensive noise reduction and an enhanced experimental experience.

2. Comes standard with a sample chamber vacuum gauge and sputtering current meter for real-time instrument status monitoring.

3. A specially designed bell jar edge rubber seal ensures long-term use without glass bell jar "chipping," which can affect the vacuum level in the sample sputtering chamber.

4. Equipped with a sputtering current controller and a micro vacuum valve. Combined with an automatic control circuit, it easily controls the vacuum chamber pressure and ionization current, allowing for the selection of the desired ionized gas to achieve optimal coating results.

5. Comes standard with a large Φ58mm x 0.12mm pure gold target for a wider sputtering range.

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