Plasma sputtering machine

Item-Name:

Plasma sputtering machine

Specification:

Introduce:

It is specially designed for making samples for scanning electron microscopy and has the characteristics of simple structure and easy use. It can perform ion sputtering on SEM samples without a high degree of vacuum, so it can be used as a basic equipment for coating SEM samples.

 

 

 

Main features

 

  1. Use 2C silent vacuum pump to comprehensively reduce noise and improve the experimental experience.

 

  1. Standardly equipped with sample chamber vacuum meter and sputtering ammeter, which can display and monitor the status of the instrument in real time.

 

  1. The specially designed rubber sealing ring on the edge of the bell jar can ensure that long-term use will not cause the "edge chipping" phenomenon of the glass bell jar that affects the vacuum degree of the sample sputtering chamber.

 

  1. Configure sputtering current controller and micro vacuum valve. Combined with the automatic control circuit, the vacuum chamber pressure and ionization current can be easily controlled, and the required ionized gas can be selected arbitrarily to obtain good coating effects.

 

  1. Standard Φ58mm x 0.12mm large-size pure gold target, wider sputtering range.

 

 

◎Brand: NOBODY