Rated temperature: 1100℃

Steady state temperature range: 100~1000℃

Temperature control mode: smart fuzzy fully closed-loop control

Touch screen graphic operation interface

7"LCD touch screen

Can meet rapid annealing after ion implantation;

Can also be used for ohmic contact fast alloys;

It can also be used for silicide alloy annealing and oxide growth;

As well as rapid thermal treatment process applications such as selenium deposition in copper indium gallium selenide photovoltaic applications.

Overall dimensions: length 920 × depth 500 × height 560 (mm)

Weight: about 40Kg

◎Passed CE certification

◎Brand: NOBODY